The POREfessional Deep Retreat Pore-Clearing Kaolin Clay Mask Sale!

The POREfessional Deep Retreat Pore-Clearing Kaolin Clay Mask

$31.20 $39.00
Size:
Condition:

SKU: I9736401256

Category:

Product Description:

Dermatologist tested and suitable for all skin types, this oh-so-comfortable clay mask promotes clear-looking pores. Spot the dots that appear as the mask dries down to see oil being drawn out, then rinse to reveal visibly refined, unclogged pores and mattified, healthy-looking skin.

Ingredients:

Aqua (Water), Kaolin, Silica, Glycerin, Butylene Glycol, Pentylene Glycol, CI 77007 (Ultramarines), PEG-40 Sorbitan Peroleate, Sodium Acrylates Copolymer, Caprylic/Capric Triglyceride, CI 77499 (Iron Oxides), Hydroxyacetophenone, Lecithin, Mica, Chlorphenesin, Bisabolol, CI 77491 (Iron Oxides), Hydrogenated Vegetable Oil, Opuntia Coccinellifera Flower Extract, CI 77891 (Titanium Dioxide), Trisodium Ethylenediamine Disuccinate, Simmondsia Chinensis (Jojoba) Seed Oil, Prunus Domestica Seed Oil, Parfum (Fragrance), Disodium Phosphate, Potassium Hydroxide, Xanthan Gum, Crithmum Maritimum Extract, 1,2-Hexanediol, Caprylyl Glycol, Tocopherol, CI 77510 (Ferric Ferrocyanide), Sodium Phosphate, Sphingolipids, Sphingomonas Ferment Extract, Tocopheryl Acetate, Citric Acid, Pentaerythrityl Tetra-Di-T-Butyl Hydroxyhydrocinnamate, Sodium Citrate.

    Directions:

    -Apply evenly to a clean, dry face and neck weekly.
    -Leave on for 30 minutes or until dry.
    -Dots appear as oil is drawn out of pores.
    -Rinse.

      Cost: $25
      Free Shipping: We offer free shipping on orders over $30. Please check the free - shipping eligibility at checkout.
      Delivery Time: It usually takes [3-5] business days for standard shipping. Please note that this is an estimated time frame and may be affected by local holidays, and unforeseen circumstances.

      Reviews

      There are no reviews yet.

      Be the first to review “The POREfessional Deep Retreat Pore-Clearing Kaolin Clay Mask”

      Your email address will not be published. Required fields are marked *